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AD - Analytical Division

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The research activity of this area, coordinated by dr. Cinzia Cepek, is primarily devoted to the growth and to the study of the electronic structure and atomic arrangement of surfaces and thin films. The mainly studied systems in the last years include fullerenes, carbon nanotubes, MgB2 and SiC thin films, and nano-structured films produced by a supersonic cluster beam source (SCBS).

AD laboratory

The AD laboratory consists of an ultra high vacuum (UHV) experimental apparatus (base pressure ≈4x10-11mbar), equipped with instrumentation devoted to the growth and to the study of the chemical composition, electronic structure and atomic arrangement of surfaces and thin films. The experimental techniques include ultra-violet and X-ray photoemission spectroscopy (UPS and XPS, respectively), Auger electron spectroscopy (AES), electron energy loss spectroscopy (EELS) and low energy electron diffraction (LEED). The thin film growth instrumentations include several UHV evaporators for molecular beam epitaxy (MBE), a plasma enhanced chemical vapour deposition (PECVD) reactor and a supersonic cluster beam source (SCBS). All the above systems are directly connected with the UHV chamber, enabling the in-situ study via electron spectroscopy just after the growth of the samples, avoiding any possible contribution due to atmospheric contamination.

A sizeable part of the work is also performed via access to international synchrotron radiation facilities.

Contacs:

dr. Cinzia Cepek

e-mail: cepek@tasc.infm.it

tel: +39-040-3756436

fax: +39-040226767

 

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